Atomic layer deposition of nanoporous biomaterials

Multiscale Simulation of Atomic Layer Deposition in a Nanoporous Material

A multiscale simulator for alumina film growth inside a nanoporous material during an atomic layer deposition process is developed. The model combines a continuum description at the macroscopic level of precursor gas transport inside a nanopore during exposure to each of the two precursor species (trimethyaluminum and water) with a lattice Monte Carlo simulation of the film growth on the micros...

Atomic Layer Deposition of TiO

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Atomic layer deposition: an overview.

Atomic layer deposition of ZnS nanotubes.

We report on the growth of high-aspect-ratio (approximately > 300) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as low as 75 degrees C. Various characterization techniques are employed to gain information on the composition, morphology and crysta...

Atomic Layer Deposition of Aluminum Oxide

I Acknowledgements II Dedication III List of Figures V